Ohio State University Orders AIXTRON CCS MOCVD System for Gallium Oxide Device Development
Ohio State University has selected Aixtron SE's CCS MOCVD system for research and development in gallium oxide and aluminum gallium oxide materials and devices. The system will be installed at Nanotech West Lab and used for epitaxial growth on 100 mm substrates. The CCS MOCVD system is known for producing high-quality, uniform thin films and supporting both academic research and industrial applications.
Aixtron SE has announced that The Ohio State University has selected its Close Coupled Showerhead® Metal-Organic Chemical Vapor Deposition (CCS MOCVD) system for advanced research and development in gallium oxide (GaO) and aluminum gallium oxide (AlGaO) materials and devices. The system will be installed at Nanotech West Lab, a shared user facility at Ohio State, and will be used for epitaxial growth on 100 mm substrates. The CCS MOCVD system is recognized for its ability to produce high-quality, uniform thin films and support both academic research and industrial applications. Disclaimer: This news brief was created by Public Technologies (PUBT) using generative artificial intelligence. While PUBT strives to provide accurate and timely information, this AI-generated content is for informational purposes only and should not be interpreted as financial, investment, or legal advice. Aixtron SE published the original content used to generate this news brief via EQS News, a service of EQS Group AG (Ref. ID: corporate_2211354_en), on November 20, 2025, and is solely responsible for the information contained therein. © Copyright 2025 - Public Technologies (PUBT)
